Imaging validation for LS of dark field low-n vs Ta-based absorber masks

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Author(s)

Kovalevich, Tatiana

;

Van Look, Lieve

;

;

Franke, Joern-Holger

;

Philipsen, Vicky

Journal

Proceedings of SPIE

Metrics

819 since deposited on 2024-01-13

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Acq. date: 2025-10-25