Publication:
Imaging validation for LS of dark field low-n vs Ta-based absorber masks
| dc.contributor.author | Kovalevich, Tatiana | |
| dc.contributor.author | Van Look, Lieve | |
| dc.contributor.author | Moussa, Alain | |
| dc.contributor.author | Franke, Joern-Holger | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.imecauthor | Kovalevich, Tatiana | |
| dc.contributor.imecauthor | Van Look, Lieve | |
| dc.contributor.imecauthor | Moussa, Alain | |
| dc.contributor.imecauthor | Franke, Joern-Holger | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.orcidimec | Kovalevich, Tatiana::0000-0001-9633-8257 | |
| dc.contributor.orcidimec | Van Look, Lieve::0009-0000-6198-024X | |
| dc.contributor.orcidimec | Moussa, Alain::0000-0002-6377-4199 | |
| dc.contributor.orcidimec | Franke, Joern-Holger::0000-0002-3571-1633 | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.date.accessioned | 2024-04-16T09:02:46Z | |
| dc.date.available | 2024-01-13T17:47:48Z | |
| dc.date.available | 2024-04-16T09:02:46Z | |
| dc.date.issued | 2023 | |
| dc.identifier.doi | 10.1117/12.2687549 | |
| dc.identifier.eisbn | 978-1-5106-6749-5 | |
| dc.identifier.isbn | 978-1-5106-6748-8 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/43402 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | Art. 1275005 | |
| dc.source.conference | International Conference on Extreme Ultraviolet Lithography | |
| dc.source.conferencedate | OCT 02-05, 2023 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 8 | |
| dc.source.volume | 12750 | |
| dc.title | Imaging validation for LS of dark field low-n vs Ta-based absorber masks | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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