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Articles
Modelling stress evolution and voiding in copper nano-interconnect under thermal gradients
Publication:
Modelling stress evolution and voiding in copper nano-interconnect under thermal gradients
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Date
2020
Journal article
https://doi.org/10.1016/j.microrel.2020.113769
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Zahedmanesh, Houman
;
Croes, Kristof
Journal
Microelectronics Reliability
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1854
since deposited on 2021-10-29
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last month
1
last week
Acq. date: 2025-12-15
Citations
Metrics
Views
1854
since deposited on 2021-10-29
4
last month
1
last week
Acq. date: 2025-12-15
Citations