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Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning

Date

2003
Meeting abstract
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dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorBeckx, Stephan
dc.contributor.authorCaymax, Matty
dc.contributor.authorClaes, Martine
dc.contributor.authorConard, Thierry
dc.contributor.authorDelabie, Annelies
dc.contributor.authorDeweerd, Wim
dc.contributor.authorKraus, Harald
dc.contributor.authorOnsia, Bart
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorPuurunen, Riikka
dc.contributor.authorRöhr, Erika
dc.contributor.authorSnow, Jim
dc.contributor.authorTsai, Wilman
dc.contributor.authorVan Doorne, Patrick
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorVertommen, Johan
dc.contributor.authorWitters, Thomas
dc.contributor.authorHeyns, Marc
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorOnsia, Bart
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-15T04:18:06Z
dc.date.available2021-10-15T04:18:06Z
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7403
dc.source.conference204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing
dc.source.conferencedate13/10/2003
dc.source.conferencelocationOrlando, FL USA
dc.title

Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning

dc.typeMeeting abstract
dspace.entity.typePublication
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