Publication:

Open-circuit potential analysis as a fast screening method for the quality of high-k dielectric layers

Date

2003
Proceedings Paper
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dc.contributor.authorClaes, Martine
dc.contributor.authorWitters, Thomas
dc.contributor.authorLoriaux, Genevieve
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDelabie, Annelies
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorOkorn-Schmidt, H.
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-15T04:09:42Z
dc.date.available2021-10-15T04:09:42Z
dc.date.embargo9999-12-31
dc.date.issued2003
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/7325
dc.source.beginpage7
dc.source.conferenceUltra Clean Processing of Silicon Surfaces 2002 - UCPSS
dc.source.conferencedate16/09/2002
dc.source.conferencelocationOostende Belgium
dc.source.endpage11
dc.title

Open-circuit potential analysis as a fast screening method for the quality of high-k dielectric layers

dc.typeProceedings paper
dspace.entity.typePublication
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