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28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow
Publication:
28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow
Date
2013
Presentation
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Chan, BT
;
Tahara, Shigeru
;
Parnell, Doni
;
Rincon Delgadillo, Paulina
;
Gronheid, Roel
;
de Marneffe, Jean-Francois
;
Xu, Kaidong
;
Nishimura, Eiichi
;
Werner, Thilo
Journal
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2128
since deposited on 2021-10-21
Acq. date: 2025-10-22
Citations
Metrics
Views
2128
since deposited on 2021-10-21
Acq. date: 2025-10-22
Citations