Publication:

Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing

Date

2010
Journal article
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dc.contributor.authorTomida, Kazuyuki
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorOpsomer, Karl
dc.contributor.authorMenou, Nicolas
dc.contributor.authorWang, Wan-Chih
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSwerts, Johan
dc.contributor.authorSteenbergen, Johnny
dc.contributor.authorKaczer, Ben
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorDetavernier, Christophe
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorWouters, Dirk
dc.contributor.authorKittl, Jorge
dc.contributor.imecauthorTomida, Kazuyuki
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorSteenbergen, Johnny
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-18T22:25:43Z
dc.date.available2021-10-18T22:25:43Z
dc.date.issued2010
dc.identifier.issn1757-8981
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18097
dc.identifier.urlhttp://iopscience.iop.org/1757-899X/8/1/012023
dc.source.beginpage12023
dc.source.issue1
dc.source.journalIOP Conference Series: Materials Science and Engineering
dc.source.volume8
dc.title

Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing

dc.typeJournal article
dspace.entity.typePublication
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