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Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm
Publication:
Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm
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Date
2021-10-12
Proceedings Paper
https://doi.org/10.1117/12.2599054
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7.39 MB
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Xu, Dongbo
;
Gillijns, Werner
;
Tan, Ling Ee
;
Philipsen, Vicky
;
Kim, Ryan Ryoung han
Journal
SPIE paper
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Downloads
116
since deposited on 2022-05-22
5
last month
2
last week
Acq. date: 2025-12-11
Views
1679
since deposited on 2022-05-22
2
last month
Acq. date: 2025-12-11
Citations