Publication:

Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm

Date

2021-10-12
Proceedings Paper
https://doi.org/10.1117/12.2599054
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dc.contributor.authorXu, Dongbo
dc.contributor.authorGillijns, Werner
dc.contributor.authorTan, Ling Ee
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.editorRonse, Kurt
dc.contributor.editorNaulleau, Patrick
dc.contributor.editorGargini, Paolo
dc.contributor.editorItani, Toshiro
dc.contributor.editorHendrickx, Eric
dc.contributor.imecauthorXu, Dongbo
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.orcidimecXu, Dongbo::0000-0003-1159-2315
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned2022-06-24T07:45:50Z
dc.date.available2022-05-22T02:19:05Z
dc.date.available2022-05-23T08:37:37Z
dc.date.available2022-06-24T07:45:50Z
dc.date.issued2021-10-12
dc.identifier.doi10.1117/12.2599054
dc.identifier.eisbn978-1-5106-4553-0
dc.identifier.isbn978-1-5106-4552-3
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/39865
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedateSEP 27-OCT 01, 2021
dc.source.conferencelocationonline
dc.source.journalSPIE paper
dc.source.numberofpages13
dc.source.volume11854
dc.title

Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm

dc.typeProceedings paper
dspace.entity.typePublication
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