Publication:
Evaluation of plasma damage in patterned low-k structures by near-field scanning probe microwave microscope: effect of plasma ash chemistry
Date
| dc.contributor.author | Urbanowicz, Adam | |
| dc.contributor.author | Talanov, Vladimir | |
| dc.contributor.author | Pantouvaki, Marianna | |
| dc.contributor.author | Struyf, Herbert | |
| dc.contributor.author | De Gendt, Stefan | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.imecauthor | Pantouvaki, Marianna | |
| dc.contributor.imecauthor | Struyf, Herbert | |
| dc.contributor.imecauthor | De Gendt, Stefan | |
| dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
| dc.date.accessioned | 2021-10-18T03:49:07Z | |
| dc.date.available | 2021-10-18T03:49:07Z | |
| dc.date.issued | 2009 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16336 | |
| dc.source.beginpage | 134 | |
| dc.source.conference | IEEE International Interconnect Technology Conference - IITC | |
| dc.source.conferencedate | 1/06/2009 | |
| dc.source.conferencelocation | Hokkaido Japan | |
| dc.source.endpage | 136 | |
| dc.title | Evaluation of plasma damage in patterned low-k structures by near-field scanning probe microwave microscope: effect of plasma ash chemistry | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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