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Galvanic corrosion of PN junctions during the dielectric removal with HF for RMG transistors

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dc.contributor.authorPacco, Antoine
dc.contributor.authorSebaai, Farid
dc.contributor.authorSuhard, Samuel
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVos, Rita
dc.contributor.authorVeloso, Anabela
dc.contributor.authorMertens, Paul
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.accessioned2021-10-19T17:01:46Z
dc.date.available2021-10-19T17:01:46Z
dc.date.issued2011-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19530
dc.source.beginpage37
dc.source.conferenceSemiconductor Cleaning Science and Technology 12
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
dc.source.endpage43
dc.title

Galvanic corrosion of PN junctions during the dielectric removal with HF for RMG transistors

dc.typeProceedings paper
dspace.entity.typePublication
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