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Characterization and residue elimination of hot aluminum etching in a transformer coupled plasma etcher
Publication:
Characterization and residue elimination of hot aluminum etching in a transformer coupled plasma etcher
Date
1996
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kopalidis, Peter
;
Vertommen, Johan
;
Badenes, Gonçal
Journal
Journal of Electrochemical Society
Abstract
Description
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Views
1900
since deposited on 2021-09-29
Acq. date: 2025-10-22
Citations
Metrics
Views
1900
since deposited on 2021-09-29
Acq. date: 2025-10-22
Citations