Publication:
Characterization and residue elimination of hot aluminum etching in a transformer coupled plasma etcher
Date
| dc.contributor.author | Kopalidis, Peter | |
| dc.contributor.author | Vertommen, Johan | |
| dc.contributor.author | Badenes, Gonçal | |
| dc.date.accessioned | 2021-09-29T14:40:30Z | |
| dc.date.available | 2021-09-29T14:40:30Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 1996 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1308 | |
| dc.source.beginpage | 1763 | |
| dc.source.endpage | 1768 | |
| dc.source.issue | 5 | |
| dc.source.journal | Journal of Electrochemical Society | |
| dc.source.volume | 143 | |
| dc.title | Characterization and residue elimination of hot aluminum etching in a transformer coupled plasma etcher | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | Original bundle
| |
| Publication available in collections: |