Publication:

Low temperature anneal of electron irradiation induced defects in p-type silicon

Date

1998
Journal article
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dc.contributor.authorTrauwaert, Marie-Astrid
dc.contributor.authorVanhellemont, Jan
dc.contributor.authorMaes, Herman
dc.contributor.authorVan Bavel, Mieke
dc.contributor.authorLangouche, G.
dc.contributor.authorClauws, P.
dc.contributor.imecauthorVan Bavel, Mieke
dc.date.accessioned2021-10-01T09:06:51Z
dc.date.available2021-10-01T09:06:51Z
dc.date.embargo9999-12-31
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2999
dc.source.beginpage1295
dc.source.endpage1298
dc.source.issue12
dc.source.journalMaterials Science and Technology
dc.source.volume14
dc.title

Low temperature anneal of electron irradiation induced defects in p-type silicon

dc.typeJournal article
dspace.entity.typePublication
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