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Cutting-edge epitaxial processes for sub 3 nm technology nodes: application to nanosheet stacks and epitaxial wrap-around contacts

Date

2021
Proceedings Paper
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dc.contributor.authorHikavyy, Andriy
dc.contributor.authorPorret, Clément
dc.contributor.authorMencarelli, M.
dc.contributor.authorLoo, Roger
dc.contributor.authorFavia, Paola
dc.contributor.authorAyyad, Mustafa
dc.contributor.authorBriggs, Basoene
dc.contributor.authorLanger, Robert
dc.contributor.authorHoriguchi, Naoto
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorPorret, Clément
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorAyyad, Mustafa
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecPorret, Clément::0000-0002-4561-348X
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.accessioned2021-10-31T08:55:48Z
dc.date.available2021-10-31T08:55:48Z
dc.date.issued2021
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/36787
dc.identifier.urlhttps://iopscience.iop.org/article/10.1149/10404.0139ecst/meta
dc.source.beginpage139
dc.source.conference240th ECS Meeting Symposiusm: Semiconductor Process Integration 12
dc.source.conferencedate10/10/2021
dc.source.conferencelocationonline online
dc.source.endpage146
dc.title

Cutting-edge epitaxial processes for sub 3 nm technology nodes: application to nanosheet stacks and epitaxial wrap-around contacts

dc.typeProceedings paper
dspace.entity.typePublication
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