Publication:
Moore's Law meets High-NA EUV: Random via patterning for next-generation nodes
| dc.contributor.author | Chowrira, B. | |
| dc.contributor.author | Carballo, V. M. Blanco | |
| dc.contributor.author | Dusa, M. | |
| dc.contributor.author | Tan, L. E. | |
| dc.contributor.author | Vats, H. | |
| dc.contributor.author | Gillijns, W. | |
| dc.contributor.author | Decoster, S. | |
| dc.contributor.author | Niroomand, A. | |
| dc.contributor.author | Rutigliani, V. D. | |
| dc.contributor.author | Halder, S. | |
| dc.contributor.author | Sangghaleh, M. | |
| dc.contributor.author | Tyagi, D. | |
| dc.contributor.author | Kamali, A. | |
| dc.contributor.author | Newman, M. | |
| dc.contributor.author | Demand, M. | |
| dc.contributor.author | Wako, Y. | |
| dc.contributor.author | Negreira, A. | |
| dc.contributor.author | Clark, R. | |
| dc.contributor.author | Nafus, K. | |
| dc.contributor.author | O'Toole, M. | |
| dc.contributor.imecauthor | Chowrira, B. | |
| dc.contributor.imecauthor | Carballo, V. M. Blanco | |
| dc.contributor.imecauthor | Dusa, M. | |
| dc.contributor.imecauthor | Tan, L. E. | |
| dc.contributor.imecauthor | Vats, H. | |
| dc.contributor.imecauthor | Gillijns, W. | |
| dc.contributor.imecauthor | Decoster, S. | |
| dc.contributor.imecauthor | Niroomand, A. | |
| dc.contributor.imecauthor | Rutigliani, V. D. | |
| dc.contributor.imecauthor | Halder, S. | |
| dc.contributor.imecauthor | Sangghaleh, M. | |
| dc.contributor.imecauthor | Tyagi, D. | |
| dc.contributor.imecauthor | Kamali, A. | |
| dc.contributor.imecauthor | Newman, M. | |
| dc.date.accessioned | 2025-07-31T04:00:03Z | |
| dc.date.available | 2025-07-31T04:00:03Z | |
| dc.date.issued | 2025 | |
| dc.description.wosFundingText | This work has been enabled in part by the NanoIC pilot line. The acquisition and operation are jointly funded by the Chips Joint Undertaking, through the European Union's Digital Europe (101183266) and Horizon Europe programs (101183277), as well as by the participating states Belgium (Flanders), France, Germany, Finland, Ireland and Romania | |
| dc.identifier.doi | 10.1117/12.3050453 | |
| dc.identifier.eisbn | 978-1-5106-8635-9 | |
| dc.identifier.isbn | 978-1-5106-8634-2 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/45989 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.conference | 2025 Conference on Optical and EUV Nanolithography | |
| dc.source.conferencedate | FEB 24-27, 2025 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.numberofpages | 7 | |
| dc.source.volume | 13424 | |
| dc.title | Moore's Law meets High-NA EUV: Random via patterning for next-generation nodes | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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