Publication:

Moore's Law meets High-NA EUV: Random via patterning for next-generation nodes

Date

2025
Proceedings Paper
https://doi.org/10.1117/12.3050453
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dc.contributor.authorChowrira Poovanna, Bhavishya
dc.contributor.authorBlanco, Victor
dc.contributor.authorDusa, Mircea
dc.contributor.authorTan, Ling Ee
dc.contributor.authorVats, H.
dc.contributor.authorGillijns, Werner
dc.contributor.authorDecoster, Stefan
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorRutigliani, Vito
dc.contributor.authorHalder, Sandip
dc.contributor.authorSangghaleh, Mahtab
dc.contributor.authorTyagi, Dhruv
dc.contributor.authorKamali, Ali
dc.contributor.authorNewman, Marcus
dc.contributor.authorDemand, M.
dc.contributor.authorWako, Y.
dc.contributor.authorNegreira, A.
dc.contributor.authorClark, R.
dc.contributor.authorNafus, K.
dc.contributor.authorO'Toole, M.
dc.contributor.imecauthorChowrira, B.
dc.contributor.imecauthorCarballo, V. M. Blanco
dc.contributor.imecauthorDusa, M.
dc.contributor.imecauthorTan, L. E.
dc.contributor.imecauthorVats, H.
dc.contributor.imecauthorGillijns, W.
dc.contributor.imecauthorDecoster, S.
dc.contributor.imecauthorNiroomand, A.
dc.contributor.imecauthorRutigliani, V. D.
dc.contributor.imecauthorHalder, S.
dc.contributor.imecauthorSangghaleh, M.
dc.contributor.imecauthorTyagi, D.
dc.contributor.imecauthorKamali, A.
dc.contributor.imecauthorNewman, M.
dc.date.accessioned2025-07-31T04:00:03Z
dc.date.available2025-07-31T04:00:03Z
dc.date.issued2025
dc.description.wosFundingTextThis work has been enabled in part by the NanoIC pilot line. The acquisition and operation are jointly funded by the Chips Joint Undertaking, through the European Union's Digital Europe (101183266) and Horizon Europe programs (101183277), as well as by the participating states Belgium (Flanders), France, Germany, Finland, Ireland and Romania
dc.identifier.doi10.1117/12.3050453
dc.identifier.eisbn978-1-5106-8635-9
dc.identifier.isbn978-1-5106-8634-2
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45989
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1342412-1
dc.source.conference2025 Conference on Optical and EUV Nanolithography
dc.source.conferencedate2025-04-22
dc.source.conferencelocationSan Jose
dc.source.endpage1342412-7
dc.source.journalProceedings of SPIE
dc.source.numberofpages7
dc.title

Moore's Law meets High-NA EUV: Random via patterning for next-generation nodes

dc.typeProceedings paper
dspace.entity.typePublication
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