Publication:
Optimized ultra-low thermal budget process flow for advanced high-K / metal gate first CMOS using laser-annealing technology
Date
| dc.contributor.author | Ortolland, Claude | |
| dc.contributor.author | Ragnarsson, Lars-Ake | |
| dc.contributor.author | Favia, Paola | |
| dc.contributor.author | Richard, Olivier | |
| dc.contributor.author | Kerner, Christoph | |
| dc.contributor.author | Chiarella, Thomas | |
| dc.contributor.author | Rosseel, Erik | |
| dc.contributor.author | Okuno, Yasutoshi | |
| dc.contributor.author | Akheyar, Amal | |
| dc.contributor.author | Tseng, Joshua | |
| dc.contributor.author | Everaert, Jean-Luc | |
| dc.contributor.author | Schram, Tom | |
| dc.contributor.author | Kubicek, Stefan | |
| dc.contributor.author | Aoulaiche, Marc | |
| dc.contributor.author | Cho, Moon Ju | |
| dc.contributor.author | Absil, Philippe | |
| dc.contributor.author | Biesemans, Serge | |
| dc.contributor.author | Hoffmann, Thomas Y. | |
| dc.contributor.imecauthor | Ragnarsson, Lars-Ake | |
| dc.contributor.imecauthor | Favia, Paola | |
| dc.contributor.imecauthor | Richard, Olivier | |
| dc.contributor.imecauthor | Kerner, Christoph | |
| dc.contributor.imecauthor | Chiarella, Thomas | |
| dc.contributor.imecauthor | Rosseel, Erik | |
| dc.contributor.imecauthor | Everaert, Jean-Luc | |
| dc.contributor.imecauthor | Schram, Tom | |
| dc.contributor.imecauthor | Kubicek, Stefan | |
| dc.contributor.imecauthor | Absil, Philippe | |
| dc.contributor.imecauthor | Biesemans, Serge | |
| dc.contributor.orcidimec | Ragnarsson, Lars-Ake::0000-0003-1057-8140 | |
| dc.contributor.orcidimec | Favia, Paola::0000-0002-1019-3497 | |
| dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
| dc.contributor.orcidimec | Chiarella, Thomas::0000-0002-6155-9030 | |
| dc.date.accessioned | 2021-10-18T01:19:21Z | |
| dc.date.available | 2021-10-18T01:19:21Z | |
| dc.date.embargo | 9999-12-31 | |
| dc.date.issued | 2009 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15951 | |
| dc.source.beginpage | 38 | |
| dc.source.conference | Symposium on VLSI Technology | |
| dc.source.conferencedate | 15/06/2009 | |
| dc.source.conferencelocation | Kyoto Japan | |
| dc.source.endpage | 39 | |
| dc.title | Optimized ultra-low thermal budget process flow for advanced high-K / metal gate first CMOS using laser-annealing technology | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | Original bundle
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