Publication:

Nanometer-scale roughness analysis of Si surfaces by TM-AFM for low-temperature epitaxy

Date

1995
Proceedings Paper
Simple item page Full metadata Statistics
 
dc.contributor.authorChollet, Frederic
dc.contributor.authorCaymax, Matty
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorAndré, E.
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.accessioned2021-09-29T13:04:31Z
dc.date.available2021-09-29T13:04:31Z
dc.date.embargo9999-12-31
dc.date.issued1995
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/554
dc.source.beginpage263
dc.source.conferenceALTECH 95: Analytical Techniques for Semiconductor Materials and Process Characterization II. Proceedings of the Satellite Sympo
dc.source.conferencedate28/09/1995
dc.source.conferencelocationDen Haag The Netherlands
dc.source.endpage270
dc.title

Nanometer-scale roughness analysis of Si surfaces by TM-AFM for low-temperature epitaxy

dc.typeProceedings paper
dspace.entity.typePublication
Files

Original bundle

Name:
525.pdf
Size:
535.75 KB
Format:
Adobe Portable Document Format
Download
Publication available in collections:
Conference contributions