Publication:

Plasma etch challenges and processing optimization in spin logic device fabrication

Date

2022-11-08
Presentation
Simple item page Full metadata Statistics
Loading...
Thumbnail Image

Files

Accepted version 70.37 MB

Author(s)

Canvel, Yann  
;
Souriau, Laurent  
;
Wan, Danny  
;
Trovato, Anna  
;
Thiam, Arame  
;
Tsvetanova, Diana  
;
Carpenter, Robert  
;
Raymenants, Eline  
;
Asselberghs, Inge  
;
Lazzarino, Frederic  
;
Couet, Sebastien  
;
Kar, Gouri Sankar  
;
Nguyen, Van Dai  

Journal

Abstract

Description

Statistics

Views

953 since deposited on 2022-11-14
Acq. date: 2026-03-01

Citations

Statistics

Views

953 since deposited on 2022-11-14
Acq. date: 2026-03-01

Citations