Publication:

Crystallization study of thin ZrO2 ALD films on Al203 and on TiN for DRAM MIMCAP applications

Date

2008
Presentation
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dc.contributor.authorPawlak, Malgorzata
dc.contributor.authorMenou, Nicolas
dc.contributor.authorWang, Xin Peng
dc.contributor.authorDilliway, G.
dc.contributor.authorPierreux, D.
dc.contributor.authorFischer, P.
dc.contributor.authorVos, Rita
dc.contributor.authorHoyer, R.
dc.contributor.authorKittl, Jorge
dc.contributor.authorWouters, Dirk
dc.contributor.authorBiesemans, Serge
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorBiesemans, Serge
dc.date.accessioned2021-10-17T09:45:08Z
dc.date.available2021-10-17T09:45:08Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14298
dc.source.conferenceMRS Spring Meeting Symposium H: Materials Science of High-k Dielectric Stacks
dc.source.conferencedate24/03/2008
dc.source.conferencelocationSan Francisco, CA USA
dc.title

Crystallization study of thin ZrO2 ALD films on Al203 and on TiN for DRAM MIMCAP applications

dc.typeOral presentation
dspace.entity.typePublication
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