On the evolution of strain and electrical properties in as-grown and annealed Si:P epitaxial films for source-drain stressor applications

dc.contributor.author	Dhayalan, Sathish Kumar
dc.contributor.author	Kujala, Jiri
dc.contributor.author	Slotte, Jonatan
dc.contributor.author	Pourtois, Geoffrey
dc.contributor.author	Simoen, Eddy
dc.contributor.author	Rosseel, Erik
dc.contributor.author	Hikavyy, Andriy
dc.contributor.author	Shimura, Yosuke
dc.contributor.author	Loo, Roger
dc.contributor.author	Vandervorst, Wilfried
dc.contributor.imecauthor	Pourtois, Geoffrey
dc.contributor.imecauthor	Simoen, Eddy
dc.contributor.imecauthor	Rosseel, Erik
dc.contributor.imecauthor	Hikavyy, Andriy
dc.contributor.imecauthor	Loo, Roger
dc.contributor.imecauthor	Vandervorst, Wilfried
dc.contributor.orcidimec	Pourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimec	Simoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimec	Hikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimec	Loo, Roger::0000-0003-3513-6058
dc.date.accessioned	2021-10-25T18:10:13Z
dc.date.available	2021-10-25T18:10:13Z
dc.date.issued	2018-04
dc.identifier.issn	2162-8769
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/30620
dc.identifier.url	http://jss.ecsdl.org/content/7/5/P228.abstract
dc.source.beginpage	P228
dc.source.endpage	P237
dc.source.issue	5
dc.source.journal	ECS Journal of Solid State Science and Technology
dc.source.volume	7
dc.title	On the evolution of strain and electrical properties in as-grown and annealed Si:P epitaxial films for source-drain stressor applications
dc.type	Journal article
dspace.entity.type	Publication
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