Publication:

Superior NBTI reliability of SiGe channel pMOSFETs: replacement Gate, FinFETs, and impact of body bias

Date

2011

Proceedings Paper

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Files

22903.pdf 662 KB

Author(s)

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Roussel, Philippe

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Ragnarsson, Lars-Ake

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Witters, Liesbeth

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Chiarella, Thomas

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Togo, Mitsuhiro

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Hikavyy, Andriy

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Horiguchi, Naoto

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Groeseneken, Guido

Statistics

1845 since deposited on 2021-10-19

Acq. date: 2026-02-24