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HfO2/spacer-interface breakdown in HfO2 high-k/poly-silicon gate stacks
Publication:
HfO2/spacer-interface breakdown in HfO2 high-k/poly-silicon gate stacks
Date
2005-06
Journal article
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Ranjan, R
;
Pey, K.L.
;
Tung, C.H.
;
Tang, L.J.
;
Elattari, Brahim
;
Kauerauf, Thomas
;
Groeseneken, Guido
;
Degraeve, Robin
;
Ang, D.S.
;
Bera, L.K.
Journal
Microelectronic Engineering
Abstract
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1995
since deposited on 2021-10-16
Acq. date: 2025-10-26
Citations
Metrics
Views
1995
since deposited on 2021-10-16
Acq. date: 2025-10-26
Citations