Publication:
Selective epitaxy of Si/SiGe to improve pMOS devices by recessed Source/Drain or buried SiGe channels
Date
| dc.contributor.author | Loo, Roger | |
| dc.contributor.imecauthor | Loo, Roger | |
| dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
| dc.date.accessioned | 2021-10-16T17:36:54Z | |
| dc.date.available | 2021-10-16T17:36:54Z | |
| dc.date.issued | 2007 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12508 | |
| dc.source.conference | Institut für Bio- und Nanosysteme - IBN1-IT | |
| dc.source.conferencedate | 26/04/2007 | |
| dc.source.conferencelocation | Jülich Duitsland | |
| dc.title | Selective epitaxy of Si/SiGe to improve pMOS devices by recessed Source/Drain or buried SiGe channels | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
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