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Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnects
Publication:
Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnects
Date
2009
Journal article
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wilson, Chris
;
Croes, Kristof
;
Zhao, Chao
;
Metzger, T.H.
;
Zhao, Larry
;
Beyer, Gerald
;
Horsfall, A.B.
;
O'Neill, A.G.
;
Tokei, Zsolt
Journal
Journal of Applied Physics
Abstract
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1941
since deposited on 2021-10-18
Acq. date: 2025-10-24
Citations
Metrics
Views
1941
since deposited on 2021-10-18
Acq. date: 2025-10-24
Citations