Publication:
Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnects
Date
| dc.contributor.author | Wilson, Chris | |
| dc.contributor.author | Croes, Kristof | |
| dc.contributor.author | Zhao, Chao | |
| dc.contributor.author | Metzger, T.H. | |
| dc.contributor.author | Zhao, Larry | |
| dc.contributor.author | Beyer, Gerald | |
| dc.contributor.author | Horsfall, A.B. | |
| dc.contributor.author | O'Neill, A.G. | |
| dc.contributor.author | Tokei, Zsolt | |
| dc.contributor.imecauthor | Wilson, Chris | |
| dc.contributor.imecauthor | Croes, Kristof | |
| dc.contributor.imecauthor | Beyer, Gerald | |
| dc.contributor.imecauthor | Tokei, Zsolt | |
| dc.contributor.orcidimec | Croes, Kristof::0000-0002-3955-0638 | |
| dc.date.accessioned | 2021-10-18T05:18:57Z | |
| dc.date.available | 2021-10-18T05:18:57Z | |
| dc.date.issued | 2009 | |
| dc.identifier.issn | 0021-8979 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/16546 | |
| dc.source.beginpage | 53524 | |
| dc.source.issue | 5 | |
| dc.source.journal | Journal of Applied Physics | |
| dc.source.volume | 106 | |
| dc.title | Synchrotron measurement of the effect of line-width scaling on stress in advanced Cu/Low-k interconnects | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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