Publication:
Improved resolution with main chain scission resists for EUV lithography
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.department | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0009-0001-2424-1322 | |
| cris.virtual.orcid | #PLACEHOLDER_PARENT_METADATA_VALUE# | |
| cris.virtual.orcid | 0000-0003-3927-5207 | |
| cris.virtualsource.department | d1f70c92-8455-4af6-aa18-c63f174f6067 | |
| cris.virtualsource.department | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
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| cris.virtualsource.orcid | d1f70c92-8455-4af6-aa18-c63f174f6067 | |
| cris.virtualsource.orcid | b4f8c238-ae6a-4a36-b09f-6a93bec3afa5 | |
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| cris.virtualsource.orcid | ffad9b55-9af5-4edb-8c86-134820dc8dd9 | |
| dc.contributor.author | Shirotori, Akihide | |
| dc.contributor.author | Hoshino, Manabu | |
| dc.contributor.author | Rathore, Ashish | |
| dc.contributor.author | Fu, Yeh Sin | |
| dc.contributor.author | De Simone, Danilo | |
| dc.contributor.author | Vandenberghe, Geert | |
| dc.contributor.author | Matsumoto, Hirokazu | |
| dc.contributor.imecauthor | Rathore, Ashish | |
| dc.contributor.imecauthor | De Simone, Danilo | |
| dc.contributor.imecauthor | Vandenberghe, Geert | |
| dc.contributor.orcidimec | De Simone, Danilo::0000-0003-3927-5207 | |
| dc.date.accessioned | 2023-06-15T13:32:46Z | |
| dc.date.available | 2022-09-10T02:52:04Z | |
| dc.date.available | 2023-06-15T13:32:46Z | |
| dc.date.issued | 2022 | |
| dc.identifier.doi | 10.1117/12.2613445 | |
| dc.identifier.eisbn | 978-1-5106-4986-6 | |
| dc.identifier.isbn | 978-1-5106-4985-9 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/40416 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | Art. 120550E | |
| dc.source.conference | Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference | |
| dc.source.conferencedate | APR 24-MAY 27, 2022 | |
| dc.source.conferencelocation | San Jose | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 10 | |
| dc.title | Improved resolution with main chain scission resists for EUV lithography | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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