Publication:

Improved resolution with main chain scission resists for EUV lithography

Date

2022
Proceedings Paper
https://doi.org/10.1117/12.2613445
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dc.contributor.authorShirotori, Akihide
dc.contributor.authorHoshino, Manabu
dc.contributor.authorRathore, Ashish
dc.contributor.authorFu, Yeh Sin
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorMatsumoto, Hirokazu
dc.contributor.imecauthorRathore, Ashish
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2023-06-15T13:32:46Z
dc.date.available2022-09-10T02:52:04Z
dc.date.available2023-06-15T13:32:46Z
dc.date.issued2022
dc.identifier.doi10.1117/12.2613445
dc.identifier.eisbn978-1-5106-4986-6
dc.identifier.isbn978-1-5106-4985-9
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40416
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpageArt. 120550E
dc.source.conferenceConference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference
dc.source.conferencedateAPR 24-MAY 27, 2022
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages10
dc.title

Improved resolution with main chain scission resists for EUV lithography

dc.typeProceedings paper
dspace.entity.typePublication
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