Publication:

Tuning and simulating a 193nm resist for 2D applications

Date

2002
Proceedings Paper
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dc.contributor.authorHoward, W.
dc.contributor.authorWiaux, Vincent
dc.contributor.authorErcken, Monique
dc.contributor.authorBui, B.
dc.contributor.authorByers, J.D.
dc.contributor.authorPochkowski, M.
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorErcken, Monique
dc.date.accessioned2021-10-14T21:50:59Z
dc.date.available2021-10-14T21:50:59Z
dc.date.embargo9999-12-31
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6412
dc.source.beginpage1190
dc.source.conferenceOptical Microlithography XV
dc.source.conferencedate5/03/2002
dc.source.conferencelocationSanta Clara, CA USA
dc.source.endpage1198
dc.title

Tuning and simulating a 193nm resist for 2D applications

dc.typeProceedings paper
dspace.entity.typePublication
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