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Electron-electron interaction signature peak in the substrate current versus gate voltage characteristics of N-channel silicon MOSFETS

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dc.contributor.authorKottantharayil, Anil
dc.contributor.authorMahapatra, S.
dc.contributor.authorEisele, I.
dc.date.accessioned2021-10-14T22:04:57Z
dc.date.available2021-10-14T22:04:57Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6496
dc.source.beginpage1283
dc.source.endpage1288
dc.source.issue7
dc.source.journalIEEE Trans. Electron Devices
dc.source.volume49
dc.title

Electron-electron interaction signature peak in the substrate current versus gate voltage characteristics of N-channel silicon MOSFETS

dc.typeJournal article
dspace.entity.typePublication
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