Publication:

Integration of the 3MS low-k CVD material in a 0.18µm Cu single damascene process

Date

1999
Presentation
Simple item page Full metadata Statistics
 
dc.contributor.authorGao, Teng
dc.contributor.authorGray, William
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMeynen, Herman
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.contributor.orcidimecStruyf, Herbert::0000-0002-6782-5424
dc.date.accessioned2021-10-06T11:11:29Z
dc.date.available2021-10-06T11:11:29Z
dc.date.issued1999
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3460
dc.source.conferenceAdvanced Metallization Conference; September 28-30, 1999; Orlando, FL, USA.
dc.title

Integration of the 3MS low-k CVD material in a 0.18µm Cu single damascene process

dc.typeOral presentation
dspace.entity.typePublication
Files
Publication available in collections:
Presentations