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Investigation of aggressively scaled HfALOx-based interpoly dielectric stacks for sub-45nm nonvolatile memory technologies
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1919 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-12
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1919 since deposited on 2021-10-16
1last month
Acq. date: 2025-12-12
Citations