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Simulation of polychromatic effects in high NA EUV lithography
Publication:
Simulation of polychromatic effects in high NA EUV lithography
Date
2021
Proceedings Paper
https://doi.org/10.1117/12.2600931
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Erdmann, Andreas
;
Mesilhy, Hazem
;
Evanschitzky, Peter
;
Saadeh, Qais
;
Soltwisch, Victor
;
Bihr, Simon
;
Zimmermann, Joerg
;
Philipsen, Vicky
Journal
Proceedings of SPIE
Abstract
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1731
since deposited on 2022-05-22
425
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Acq. date: 2025-10-24
Citations
Metrics
Views
1731
since deposited on 2022-05-22
425
item.page.metrics.field.last-week
Acq. date: 2025-10-24
Citations