Simulation of polychromatic effects in high NA EUV lithography

dc.contributor.author	Erdmann, Andreas
dc.contributor.author	Mesilhy, Hazem
dc.contributor.author	Evanschitzky, Peter
dc.contributor.author	Saadeh, Qais
dc.contributor.author	Soltwisch, Victor
dc.contributor.author	Bihr, Simon
dc.contributor.author	Zimmermann, Joerg
dc.contributor.author	Philipsen, Vicky
dc.contributor.imecauthor	Philipsen, Vicky
dc.contributor.orcidimec	Philipsen, Vicky::0000-0002-2959-432X
dc.date.accessioned	2022-06-28T13:36:33Z
dc.date.available	2022-05-22T02:19:15Z
dc.date.available	2022-05-23T10:55:10Z
dc.date.available	2022-06-28T13:36:33Z
dc.date.issued	2021
dc.identifier.doi	10.1117/12.2600931
dc.identifier.eisbn	978-1-5106-4553-0
dc.identifier.isbn	978-1-5106-4552-3
dc.identifier.issn	0277-786X
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/39877
dc.publisher	SPIE-INT SOC OPTICAL ENGINEERING
dc.source.conference	International Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate	SEP 27-OCT 01, 2021
dc.source.conferencelocation	online
dc.source.journal	Proceedings of SPIE
dc.source.numberofpages	13
dc.source.volume	11854
dc.subject.discipline	Applied physics
dc.subject.keywords	EUV lithography, high NA, computational lithography, EUV masks, EUV absorber materials, telecentricity, 3D mask e ects, polychromatic e ects, exposure bandwidth
dc.title	Simulation of polychromatic effects in high NA EUV lithography
dc.type	Proceedings paper
dspace.entity.type	Publication
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