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Iodine enhanced focused ion beam etching of silicon for photonic device modification and prototyping

Date

2008-06
Proceedings Paper
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dc.contributor.authorSchrauwen, Jonathan
dc.contributor.authorVan Lysebettens, J.
dc.contributor.authorVanhoutte, M.
dc.contributor.authorVan Thourhout, Dries
dc.contributor.authorBaets, Roel
dc.contributor.imecauthorVan Thourhout, Dries
dc.contributor.imecauthorBaets, Roel
dc.contributor.orcidimecVan Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimecBaets, Roel::0000-0003-1266-1319
dc.date.accessioned2021-10-17T10:37:01Z
dc.date.available2021-10-17T10:37:01Z
dc.date.embargo9999-12-31
dc.date.issued2008-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14448
dc.source.beginpage4
dc.source.conference1st International Workshop on FIB for Photonics (Colocated with the 14th European Conference on Integrated Optics (ECIO))
dc.source.conferencedate13/06/2008
dc.source.conferencelocationEindhoven the Netherlands
dc.source.endpage7
dc.title

Iodine enhanced focused ion beam etching of silicon for photonic device modification and prototyping

dc.typeProceedings paper
dspace.entity.typePublication
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