Publication:

Etching of tungsten via a combination of thermal oxide formation and wet-chemical oxide dissolution

Date

2025
Journal article
https://doi.org/10.1016/j.mee.2024.112304
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dc.contributor.authorPacco, Antoine
dc.contributor.authorNakano, Teppei
dc.contributor.authorLoyo Prado, Jana
dc.contributor.authorLai, Ju-Geng
dc.contributor.authorKawarazaki, Hikaru
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorLai, Ju-Geng
dc.contributor.imecauthorLoyo Prado, Jana
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.orcidimecPacco, Antoine::0000-0001-6330-5053
dc.contributor.orcidimecLoyo Prado, Jana::0009-0000-8595-0918
dc.contributor.orcidimecAltamirano Sanchez, Efrain::0000-0003-3235-6055
dc.date.accessioned2025-07-31T09:41:46Z
dc.date.available2025-01-16T18:30:51Z
dc.date.available2025-07-31T09:41:46Z
dc.date.issued2025
dc.identifier.doi10.1016/j.mee.2024.112304
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/45085
dc.publisherELSEVIER
dc.source.beginpageArt. 112304
dc.source.endpageN/A
dc.source.issue1 March
dc.source.journalMICROELECTRONIC ENGINEERING
dc.source.numberofpages6
dc.source.volume297
dc.subject.keywordsOXIDATION
dc.title

Etching of tungsten via a combination of thermal oxide formation and wet-chemical oxide dissolution

dc.typeJournal article
dspace.entity.typePublication
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