Publication:

Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography

Date

2013
Journal article
https://doi.org/10.1117/1.JMM.12.3.031107
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dc.contributor.authorGrella, Luca
dc.contributor.authorCarroll, Alan
dc.contributor.authorMurray, Kirk
dc.contributor.authorMcCord, Mark A.
dc.contributor.authorTong, William M.
dc.contributor.authorBrodie, Alan D.
dc.contributor.authorGubiotti, Thomas
dc.contributor.authorSun, Fuge
dc.contributor.authorKidwingira, Francoise
dc.contributor.authorKojima, Shinichi
dc.contributor.authorPetric, Paul
dc.contributor.authorBevis, Christopher F.
dc.contributor.authorVereecke, Bart
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorMane, Anil U.
dc.contributor.authorElam, Jeffrey W.
dc.contributor.imecauthorVereecke, Bart
dc.contributor.imecauthorHaspeslagh, Luc
dc.date.accessioned2021-10-21T08:00:22Z
dc.date.available2021-10-21T08:00:22Z
dc.date.issued2013
dc.identifier.doi10.1117/1.JMM.12.3.031107
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22430
dc.identifier.urlhttp://nanolithography.spiedigitallibrary.org/article.aspx?articleid=1724607
dc.source.beginpage31107
dc.source.issue3
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.volume12
dc.title

Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography

dc.typeJournal article
dspace.entity.typePublication
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