Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film

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Author(s)

Travaly, Youssef

;

Eyckens, Brenda

;

Carbonell, Laure

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Rothschild, Aude

;

;

Brongersma, Sywert

;

;

Struyf, Herbert

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Furukawa, Yukiko

;

Stucchi, Michele

;

Schaekers, Marc

;

;

;

Vanhaelemeersch, Serge

;

;

;

Van Autryve, Luc

;

Journal

Microelectronic Engineering

Metrics

1960 since deposited on 2021-10-14

Acq. date: 2025-10-23