Publication:

Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film

Date

2002

Journal article

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Author(s)

Travaly, Youssef

;

Eyckens, Brenda

;

Carbonell, Laure

;

Rothschild, Aude

;

;

Brongersma, Sywert

;

;

Struyf, Herbert

;

Furukawa, Yukiko

;

Stucchi, Michele

;

Schaekers, Marc

;

;

;

Vanhaelemeersch, Serge

;

;

;

Van Autryve, Luc

;

Journal

Microelectronic Engineering

Statistics

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