Publication:
Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
Date
| dc.contributor.author | Travaly, Youssef | |
| dc.contributor.author | Eyckens, Brenda | |
| dc.contributor.author | Carbonell, Laure | |
| dc.contributor.author | Rothschild, Aude | |
| dc.contributor.author | Le, Quoc Toan | |
| dc.contributor.author | Brongersma, Sywert | |
| dc.contributor.author | Ciofi, Ivan | |
| dc.contributor.author | Struyf, Herbert | |
| dc.contributor.author | Furukawa, Yukiko | |
| dc.contributor.author | Stucchi, Michele | |
| dc.contributor.author | Schaekers, Marc | |
| dc.contributor.author | Bender, Hugo | |
| dc.contributor.author | Rosseel, Erik | |
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.author | Gaillard, F. | |
| dc.contributor.author | Van Autryve, Luc | |
| dc.contributor.author | Rabinzohn, P. | |
| dc.contributor.imecauthor | Le, Quoc Toan | |
| dc.contributor.imecauthor | Brongersma, Sywert | |
| dc.contributor.imecauthor | Ciofi, Ivan | |
| dc.contributor.imecauthor | Struyf, Herbert | |
| dc.contributor.imecauthor | Stucchi, Michele | |
| dc.contributor.imecauthor | Schaekers, Marc | |
| dc.contributor.imecauthor | Bender, Hugo | |
| dc.contributor.imecauthor | Rosseel, Erik | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.contributor.imecauthor | Van Autryve, Luc | |
| dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
| dc.contributor.orcidimec | Brongersma, Sywert::0000-0002-1755-3897 | |
| dc.contributor.orcidimec | Ciofi, Ivan::0000-0003-1374-4116 | |
| dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.date.accessioned | 2021-10-14T23:23:37Z | |
| dc.date.available | 2021-10-14T23:23:37Z | |
| dc.date.issued | 2002 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/6888 | |
| dc.source.beginpage | 367 | |
| dc.source.endpage | 374 | |
| dc.source.issue | 1_4 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 64 | |
| dc.title | Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
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