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Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film

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dc.contributor.authorTravaly, Youssef
dc.contributor.authorEyckens, Brenda
dc.contributor.authorCarbonell, Laure
dc.contributor.authorRothschild, Aude
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorBrongersma, Sywert
dc.contributor.authorCiofi, Ivan
dc.contributor.authorStruyf, Herbert
dc.contributor.authorFurukawa, Yukiko
dc.contributor.authorStucchi, Michele
dc.contributor.authorSchaekers, Marc
dc.contributor.authorBender, Hugo
dc.contributor.authorRosseel, Erik
dc.contributor.authorVanhaelemeersch, Serge
dc.contributor.authorMaex, Karen
dc.contributor.authorGaillard, F.
dc.contributor.authorVan Autryve, Luc
dc.contributor.authorRabinzohn, P.
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorBrongersma, Sywert
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorStucchi, Michele
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorVanhaelemeersch, Serge
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorVan Autryve, Luc
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecBrongersma, Sywert::0000-0002-1755-3897
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVanhaelemeersch, Serge::0000-0003-2102-7395
dc.date.accessioned2021-10-14T23:23:37Z
dc.date.available2021-10-14T23:23:37Z
dc.date.issued2002
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/6888
dc.source.beginpage367
dc.source.endpage374
dc.source.issue1_4
dc.source.journalMicroelectronic Engineering
dc.source.volume64
dc.title

Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film

dc.typeJournal article
dspace.entity.typePublication
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