Reducing optical losses in focused-ion-beam etched silicon

dc.contributor.author	Schrauwen, Jonathan
dc.contributor.author	Van Thourhout, Dries
dc.contributor.author	Baets, Roel
dc.contributor.author	Klein, E.
dc.contributor.author	Ay, F.
dc.contributor.author	Hopman, W.
dc.contributor.author	De Ridder, R.
dc.contributor.imecauthor	Van Thourhout, Dries
dc.contributor.imecauthor	Baets, Roel
dc.contributor.orcidimec	Van Thourhout, Dries::0000-0003-0111-431X
dc.contributor.orcidimec	Baets, Roel::0000-0003-1266-1319
dc.date.accessioned	2021-10-17T10:38:01Z
dc.date.available	2021-10-17T10:38:01Z
dc.date.embargo	9999-12-31
dc.date.issued	2008
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/14451
dc.source.conference	52nd International Conference on Electron, Ion, and Photon Beam Technology & Nanofabrication - EIPBN
dc.source.conferencedate	27/05/2008
dc.source.conferencelocation	Portland, OR USA
dc.title	Reducing optical losses in focused-ion-beam etched silicon
dc.type	Oral presentation
dspace.entity.type	Publication
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