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Dry etching of Mo based layers and its interdependence with a poly-Si/MoOxNy/TiN/HfO2 gate stack
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Dry etching of Mo based layers and its interdependence with a poly-Si/MoOxNy/TiN/HfO2 gate stack
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Date
2013
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Paraschiv, Vasile
;
Boullart, Werner
;
Altamirano Sanchez, Efrain
Journal
Microelectronic Engineering
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1974
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Acq. date: 2026-02-24
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Views
1974
since deposited on 2021-10-21
1
last month
1
last week
Acq. date: 2026-02-24
Citations