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Dry etching of Mo based layers and its interdependence with a poly-Si/MoOxNy/TiN/HfO2 gate stack
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Dry etching of Mo based layers and its interdependence with a poly-Si/MoOxNy/TiN/HfO2 gate stack
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Date
2013
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Paraschiv, Vasile
;
Boullart, Werner
;
Altamirano Sanchez, Efrain
Journal
Microelectronic Engineering
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1973
since deposited on 2021-10-21
1
last month
Acq. date: 2025-12-17
Citations
Metrics
Views
1973
since deposited on 2021-10-21
1
last month
Acq. date: 2025-12-17
Citations