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Dry etching of Mo based layers and its interdependence with a poly-Si/MoOxNy/TiN/HfO2 gate stack

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1974 since deposited on 2021-10-21
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Acq. date: 2026-02-24

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1974 since deposited on 2021-10-21
1last month
1last week
Acq. date: 2026-02-24

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