Publication:

Atomic layer deposition of Ru and RuO2 for MIMCAP applications

Date

2009
Proceedings Paper
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dc.contributor.authorZhao, Chao
dc.contributor.authorPawlak, Malgorzata
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorSchaekers, Marc
dc.contributor.authorSleeckx, Erik
dc.contributor.authorVancoille, Eric
dc.contributor.authorWouters, Dirk
dc.contributor.authorTokei, Zsolt
dc.contributor.authorKittl, Jorge
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.date.accessioned2021-10-18T05:45:09Z
dc.date.available2021-10-18T05:45:09Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/16605
dc.source.beginpage377
dc.source.conferenceAtomic Layer Deposition Applications 5
dc.source.conferencedate4/10/2009
dc.source.conferencelocationVienna Austria
dc.source.endpage387
dc.title

Atomic layer deposition of Ru and RuO2 for MIMCAP applications

dc.typeProceedings paper
dspace.entity.typePublication
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