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Comparison of sub 1 nm TiN/HfO2 with Poly-Si/HfO2 gate stacks u sing scaled chemical oxide interfaces

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2051 since deposited on 2021-10-15
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Acq. date: 2026-01-25

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2051 since deposited on 2021-10-15
2last month
1last week
Acq. date: 2026-01-25

Citations