Publication:
Comparison of sub 1 nm TiN/HfO2 with Poly-Si/HfO2 gate stacks u sing scaled chemical oxide interfaces
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2047 since deposited on 2021-10-15
Acq. date: 2025-10-23
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Views
2047 since deposited on 2021-10-15
Acq. date: 2025-10-23
Citations