Publication:
Comparison of sub 1 nm TiN/HfO2 with Poly-Si/HfO2 gate stacks u sing scaled chemical oxide interfaces
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2052 since deposited on 2021-10-15
1last month
Acq. date: 2026-02-27
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Statistics
Views
2052 since deposited on 2021-10-15
1last month
Acq. date: 2026-02-27
Citations