Publication:
Internal photoemission at interfaces of ALD TaiOx insulating layers deposited on Si, InP and In0.53Ga0.47As
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1920 since deposited on 2021-10-20
1last month
Acq. date: 2026-01-06
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Metrics
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1920 since deposited on 2021-10-20
1last month
Acq. date: 2026-01-06
Citations