Publication:
Internal photoemission at interfaces of ALD TaiOx insulating layers deposited on Si, InP and In0.53Ga0.47As
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1917 since deposited on 2021-10-20
Acq. date: 2025-10-23
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1917 since deposited on 2021-10-20
Acq. date: 2025-10-23
Citations