Publication:
Characterisation of the silicon nitride thin films deposited by plasmamagnetron
Date
| dc.contributor.author | Batan, A | |
| dc.contributor.author | Franquet, Alexis | |
| dc.contributor.author | Vereecken, Jean | |
| dc.contributor.author | Reniers, Francois | |
| dc.contributor.imecauthor | Franquet, Alexis | |
| dc.contributor.orcidimec | Franquet, Alexis::0000-0002-7371-8852 | |
| dc.date.accessioned | 2021-10-17T06:15:31Z | |
| dc.date.available | 2021-10-17T06:15:31Z | |
| dc.date.issued | 2008 | |
| dc.identifier.issn | 0142-2421 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13347 | |
| dc.source.beginpage | 754 | |
| dc.source.endpage | 757 | |
| dc.source.issue | 3_4 | |
| dc.source.journal | Surface and Interface Analysis | |
| dc.source.volume | 40 | |
| dc.title | Characterisation of the silicon nitride thin films deposited by plasmamagnetron | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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