Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
Minimizing within die non uniformity in CMP by optimising polishing parameters and consumables
Publication:
Minimizing within die non uniformity in CMP by optimising polishing parameters and consumables
Date
1997
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
1871.pdf
683.96 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Grillaert, Joost
;
Meynen, Herman
;
Waeterloos, Joost
;
Coenegrachts, Bart
;
Van den hove, Luc
Journal
Abstract
Description
Metrics
Views
1930
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations
Metrics
Views
1930
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations