Publication:

Wafer bevel protection during deep reactive ion etching

Date

2011

Journal article

Simple item page Full metadata Statistics

Files

22396.pdf 797.09 KB

Author(s)

;

;

Altamirano Sanchez, Efrain

;

Van Aelst, Joke

;

Devriendt, Katia

;

Van Wichelen, Koen

;

;

;

De Backer, Eddy

Journal

IEEE Transactions on Semiconductor Manufacturing

Statistics

2146 since deposited on 2021-10-19

Acq. date: 2026-04-05