Wafer bevel protection during deep reactive ion etching

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Author(s)

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Altamirano Sanchez, Efrain

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Van Aelst, Joke

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Devriendt, Katia

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Van Wichelen, Koen

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De Backer, Eddy

Journal

IEEE Transactions on Semiconductor Manufacturing

Metrics

2131 since deposited on 2021-10-19

Acq. date: 2025-10-23