Publication:

Wafer bevel protection during deep reactive ion etching

Date

2011

Journal article

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22396.pdf 797.09 KB

Author(s)

;

;

Altamirano Sanchez, Efrain

;

Van Aelst, Joke

;

Devriendt, Katia

;

Van Wichelen, Koen

;

;

;

De Backer, Eddy

Journal

IEEE Transactions on Semiconductor Manufacturing

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