Publication:
Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
| dc.contributor.author | Saadeh, Qais | |
| dc.contributor.author | Mesilhy, Hazem | |
| dc.contributor.author | Soltwisch, Victor | |
| dc.contributor.author | Erdmann, Andreas | |
| dc.contributor.author | Ciesielski, Richard | |
| dc.contributor.author | Lohr, Leonhard | |
| dc.contributor.author | Andrle, Anna | |
| dc.contributor.author | Philipsen, Vicky | |
| dc.contributor.author | Thakare, Devesh | |
| dc.contributor.author | Laubis, Christian | |
| dc.contributor.author | Scholze, Frank | |
| dc.contributor.author | Kolbe, Michael | |
| dc.contributor.imecauthor | Philipsen, Vicky | |
| dc.contributor.imecauthor | Thakare, Devesh | |
| dc.contributor.orcidimec | Philipsen, Vicky::0000-0002-2959-432X | |
| dc.contributor.orcidimec | Thakare, Devesh::0000-0003-3265-7042 | |
| dc.date.accessioned | 2023-06-08T09:45:33Z | |
| dc.date.available | 2023-02-15T03:23:36Z | |
| dc.date.available | 2023-02-16T08:05:56Z | |
| dc.date.available | 2023-06-08T09:45:33Z | |
| dc.date.issued | 2022 | |
| dc.description.wosFundingText | This project has received funding from the Electronic Component Systems for European Leadership Joint Undertaking under grant agreement No 783247 -Technology Advances for Pilot line of Enhanced Semiconductors for 3 nm (TAPES3) and from the EMPIR Metrology for Industry project under grant No 20IND04 -Traceable metrology of soft X-ray to IR optical constants and nanofilms for advanced manufacturing (ATMOC). This Joint Undertaking receives support from the European Union's Horizon 2020 research and innovation program alongside Netherlands, Belgium, Germany, France, Austria, United Kingdom, Israel, and Switzerland. | |
| dc.identifier.doi | 10.1117/12.2643246 | |
| dc.identifier.eisbn | 978-1-5106-5642-0 | |
| dc.identifier.issn | 0277-786X | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/41098 | |
| dc.publisher | SPIE-INT SOC OPTICAL ENGINEERING | |
| dc.source.beginpage | Art. 122930Y | |
| dc.source.conference | Photomask Technology Conference | |
| dc.source.conferencedate | SEP 26-29, 2022 | |
| dc.source.conferencelocation | Monterey | |
| dc.source.journal | Proceedings of SPIE | |
| dc.source.numberofpages | 12 | |
| dc.source.volume | 12293 | |
| dc.subject.keywords | EXTREME-ULTRAVIOLET | |
| dc.subject.keywords | REFRACTIVE-INDEX | |
| dc.subject.keywords | DIFFRACTION | |
| dc.subject.keywords | REFLECTION | |
| dc.subject.keywords | SCATTERING | |
| dc.subject.keywords | photomask | |
| dc.subject.keywords | Mask 3D effects | |
| dc.subject.keywords | EUV lithography, high NA, computational lithography, EUV masks, EUV absorber materials | |
| dc.title | Precise optical constants: determination and impact on metrology, simulation and development of EUV masks | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
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