Publication:

The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approach

Date

2024
Proceedings Paper
https://doi.org/10.1117/12.3010917
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dc.contributor.authorTiwari, Atul
dc.contributor.authorFallica, Roberto
dc.contributor.authorAckermann, Marcelo D.
dc.contributor.authorMakhotkin, Igor A.
dc.contributor.imecauthorFallica, Roberto
dc.contributor.orcidimecFallica, Roberto::0000-0003-4523-9624
dc.date.accessioned2024-08-20T08:08:46Z
dc.date.available2024-06-15T17:25:53Z
dc.date.available2024-08-20T08:08:46Z
dc.date.embargo2024-04-09
dc.date.issued2024
dc.description.wosFundingTextThe work was performed in the frame of the NEXT3D project funded by TKI Connecting Industry call with the support of Malvern Panalytical. We kindly acknowledge S. Yakunin for friendly discussion on XSW technique. We kindly acknowledge the help of Hironori Oka and Keita Kato (Fujifilm Electronic Materials Europe) for providing photoresist materials. We kindly acknowledge Milen Gateshki (Malvern Panalytical) for useful discussions and help with editing of this manuscript.
dc.identifier.doi10.1117/12.3010917
dc.identifier.eisbn978-1-5106-7217-8
dc.identifier.isbn978-1-5106-7216-1
dc.identifier.issn0277-786X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/44049
dc.publisherSPIE-INT SOC OPTICAL ENGINEERING
dc.source.beginpage1295505
dc.source.conferenceConference on Metrology, Inspection, and Process Control XXXVIII
dc.source.conferencedateFEB 26-29, 2024
dc.source.conferencelocationSan Jose
dc.source.journalProceedings of SPIE
dc.source.numberofpages4
dc.source.volume12955
dc.subject.keywordsRESIST
dc.title

The interface study of photoresist/underlayer using hybrid x-ray reflectivity and x-ray standing wave approach

dc.typeProceedings paper
dspace.entity.typePublication
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