Publication:

High volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL

Date

2017
Proceedings Paper
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dc.contributor.authorSayan, Safak
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorHetel, Iulian
dc.contributor.authorChan, BT
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorBlanco, Victor
dc.contributor.authorFoubert, Philippe
dc.contributor.authorD'Urzo, Lucia
dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVandenberghe, Geert
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorHetel, Iulian
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorD'Urzo, Lucia
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.date.accessioned2021-10-24T13:00:47Z
dc.date.available2021-10-24T13:00:47Z
dc.date.embargo9999-12-31
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29385
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2618452
dc.source.beginpage101430U
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.title

High volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL

dc.typeProceedings paper
dspace.entity.typePublication
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