Publication:
Feasability of TiSi2 and CoSi2 for sub quarter micron processes
Date
| dc.contributor.author | Vanhaelemeersch, Serge | |
| dc.contributor.author | Baklanov, Mikhaïl | |
| dc.contributor.author | Maex, Karen | |
| dc.contributor.imecauthor | Vanhaelemeersch, Serge | |
| dc.contributor.imecauthor | Maex, Karen | |
| dc.contributor.orcidimec | Vanhaelemeersch, Serge::0000-0003-2102-7395 | |
| dc.date.accessioned | 2021-09-29T15:43:46Z | |
| dc.date.available | 2021-09-29T15:43:46Z | |
| dc.date.issued | 1996 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1605 | |
| dc.source.conference | International Conference on Advanced Metallization and Interconnect Systems for ULSI Applications | |
| dc.source.conferencedate | 1/10/1996 | |
| dc.source.conferencelocation | Boston, MA USA | |
| dc.title | Feasability of TiSi2 and CoSi2 for sub quarter micron processes | |
| dc.type | Oral presentation | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |